http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201415490-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_49f5a779eff1897763fbeb8273e8ab99 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K85-1135 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K2102-102 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-549 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1888 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10K30-82 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-30 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-44 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B5-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01B13-00 |
| filingDate | 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e87107e1f3581706a4d241c8b733e110 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42cc3c6144a1917e629a2689b1edaf29 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eec0d9c56dd9b9667c1d97396f132777 |
| publicationDate | 2014-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201415490-A |
| titleOfInvention | Method of forming a transparent conductive layer on a substrate |
| abstract | The present invention provides a method of forming a transparent conductive layer on a substrate, comprising: applying a conductive composition comprising a conductive polymer to a substrate to form a transparent conductive layer on the substrate; forming a patterned protective layer on the transparent conductive a transparent conductive layer region covered by the protective layer and a transparent conductive layer region not covered by the protective layer; wet etching the transparent conductive layer region covered by the unprotected layer; and removing the protective layer Wherein the transparent conductive layer is annealed before or after the wet etching. The method provided by the invention can reduce the chromatic aberration caused by the transparent conductive layer between the etched portion and the unetched portion; and the method of the invention is simpler than the conventional method because the invention does not need to use an additional optical layer to reduce the chromatic aberration. And more economical. |
| priorityDate | 2012-10-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 50.