http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201409177-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07F5-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-265 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0395 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate | 2013-05-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6fb03c6048dc0bedca91ce5ae3ecb7e8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 |
| publicationDate | 2014-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201409177-A |
| titleOfInvention | Positive-type photoresist composition for thick film, manufacturing method of thick film photoresist pattern, and manufacturing method of connection terminal |
| abstract | An object of the present invention is to provide a resistive pattern forming method for a thick film positive resist composition, a resistive pattern forming method for a thick film positive resist composition, and a method for producing a connecting terminal. The solution is that the positive photoresist composition used for forming the thick film photoresist pattern on the support contains a resin component (A) which changes the solubility with respect to the developing solution by the action of an acid, and An acid generator component (B) which is formed by exposure, and the acid generator component (B) is an acid generator (B1) containing a compound represented by the following formula (b1-1). Y1 is a divalent linking group, W is S, Se or I, R1 is a hydrocarbon group which may have a substituent, R2 is an alkyl group having 1 to 5 carbon atoms or an alkoxy group; when W=I, m+n= 2, when W=S, Se, m+n=3, and m≧1, n≧0; p is 0~5; X- is a pair of anions]. □ |
| priorityDate | 2012-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 392.