http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201409176-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C381-12 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C317-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C309-19 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F212-14 |
| filingDate | 2012-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_490066517db8a09176cacf92e3c31263 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_160f420b6e292320c7c71a5415bc0cfc |
| publicationDate | 2014-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201409176-A |
| titleOfInvention | Method for forming photoresist composition and photoresist pattern |
| abstract | The photoresist composition of the first aspect of the present invention contains the resin component (A) which changes the solubility to the alkali developing solution by the action of an acid, and the acid generating component (B) which generates an acid by exposure. The resin component (A) contains a constituent unit (a0) derived from hydroxystyrene, and the acid generating component (B) contains a dialkylsulfonyldiazomethane-based acid generating component (B1) and a cation portion. The aryl group contained is an acid generating component (B2) of a fluoroalkylsulfonium sulfonate-based salt and an acid generating component (B3) of a camphorsulfonium sulfonate-based salt. |
| priorityDate | 2012-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 139.