| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_d80f1040809503e54509c871ba828f75 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02271
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02304
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-0272
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02269
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02115
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02527 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-26 |
| filingDate |
2013-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bd12c1c52113c29868c9193838b0c7f5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9e7d804de05248aa8840b504c488566e
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f24a88f2be5e6ed2557eebc5a63d84 |
| publicationDate |
2014-03-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201408814-A |
| titleOfInvention |
Method and device for forming carbon film |
| abstract |
In accordance with an embodiment of the present disclosure, a method of forming a carbon film on a substrate to be processed is provided. The method comprises: loading a substrate to be processed formed with a carbon film into a processing chamber of a film forming apparatus (Process 1), and thermally decomposing a hydrocarbon carbon source gas in the processing chamber to be processed A carbon film is formed on the substrate (Process 2). In the treatment 2, the film formation temperature of the carbon film is set to a temperature lower than the elemental mass of the hydrocarbon carbon source gas without the plasma-assisted thermal decomposition temperature, and the thermal decomposition of the hydrocarbon carbon source gas and the halogen-containing element A temperature drop gas is introduced into the processing chamber and a non-plasma thermal chemical vapor deposition method is performed. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113151801-A
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-113151801-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I675930-B |
| priorityDate |
2012-07-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |