| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_38ed56a4b4e8e2315b2b3308bffedb3f |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-80 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-22 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-22
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24 |
| filingDate |
2013-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7552405e7eb4fe2e1c48cde52b9001bb
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_678acc16449e27db4cefb5f7669058e5
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_56c80b623e5cd34e711c68d999d57632
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eafd21dd1b4c044f28def36abac0f20d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_fced711fd57d064d4a39d4d525e01d07
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b06a049641f94e15cc9b7d5b79c78320 |
| publicationDate |
2014-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201407261-A |
| titleOfInvention |
Method for forming extreme ultraviolet ray mask |
| abstract |
The method for forming an extreme ultraviolet ray mask of the present invention comprises: providing a substrate, forming a reflective multilayer structure on the substrate, forming a buffer layer on the reflective multilayer structure, forming an absorbing layer on the buffer layer, and forming a cap layer on the absorbing layer on. The etched cap layer and the absorbing layer form an extreme ultraviolet ray mask. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I567479-B |
| priorityDate |
2012-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |