Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1803 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-091 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1807 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1805 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-18 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1804 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1808 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1811 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-22 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-281 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
filingDate |
2013-05-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_075a3a80b789dfad4c9a83d380354072 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_f6c6059ee63d401b74530c18ab1a4ed6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86f0a33c356d5d61335189d847330926 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_62e2892b2a05b9e1f66c57d72e144851 |
publicationDate |
2014-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201405242-A |
titleOfInvention |
Pattern forming method, sensitizing ray or radiation sensitive resin composition, resist film, method of manufacturing electronic component, and electronic component |
abstract |
There is provided a method of forming a pattern comprising (i) a step of forming a film by sensitizing a radiographic or radiation sensitive resin composition; (ii) a step of exposing the film; and (iii) using an organic solvent a developing solution for developing a negative pattern, wherein the sensitizing ray-sensitive or radiation-sensitive resin composition contains (A) an acid capable of increasing polarity to reduce solubility in a developing solution containing an organic solvent. The resin, (B) a compound capable of generating an acid under actinic radiation or radiation, (C) a solvent, and (D) a resin having a repeating unit having a fluorine atom and having no CF3 partial structure. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I788477-B |
priorityDate |
2012-05-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |