| abstract |
An object of the present invention is to provide a processing liquid and a method for producing a microstructure using the same, which inhibits pattern collapse of a microstructure (that is, a semiconductor device or a micromachine). In order to achieve the above object, the treatment is carried out in a treatment liquid containing an alkylphosphonic acid having a carbon number of 6 to 18 or a salt thereof, water, and a water-soluble solvent, and the treatment liquid is used for suppressing the metal fine structure. The pattern collapsed. |