| abstract |
The present invention discloses polymeric materials, methods for making such polymeric materials, and photoresist formulations utilizing such polymeric materials. In one aspect, a polymeric material comprising a phenol monomer composition comprising an aldehyde and comprising m-cresol, p-cresol, 3,5-dimethylphenol, and 2,5-dimethylphenol is provided The condensation product of the reaction mixture. The polymeric material can be further contacted with a photoactive compound and a solvent to form a photoresist formulation. |