| abstract |
The present invention relates to an alkaline etching solution for producing a solar cell comprising (A) a monosulfonic acid or a disulfonic acid represented by the general formula [1] or a salt thereof, (B) a basic compound, and (C) water, And a method for producing a ruthenium-based substrate for manufacturing a solar cell, wherein the etchant is used to etch a wafer containing ruthenium as a main component, and an uneven structure is formed on a surface of the wafer: Each of p R1 independently represents a hydrogen atom, a hydroxyl group or an alkyl group having 1 to 10 carbon atoms, and q M each independently represents a hydrogen atom, an alkali metal atom, an ammonium (NH4) group or a tetraalkylammonium (R24N) group ( In the formula, R2 represents an alkyl group having 1 to 4 carbon atoms, n represents 0 or 1, and p and q each independently represent 1 or 2}. |