http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201400996-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a3b10024b9fe3eb940006e1ae7cc8b26 |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-422 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-96 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
filingDate | 2012-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e62a2c1bbbc838b397b78a791c27dfa http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b970e8816be93244bb981eec2a6ef5b8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5677bab101761fc78cff72ac18e9d4fd http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ceb48b6b98d3b461c372236405065d53 |
publicationDate | 2014-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201400996-A |
titleOfInvention | Photoresist stripper |
abstract | The present invention provides a photoresist release agent which has excellent photoresist peeling performance as a photoresist release agent and which does not precipitate or reattach to the substrate when washed with pure water. Furthermore, the present invention provides a photoresist release agent that is non-corrosive and reusable for metal wiring, especially for copper wiring. The photoresist stripper of the present invention is characterized in that it is selected from 50 to 99% by mass of (A) one selected from ethyl carbonate, propyl carbonate, γ-butyrolactone and cyclopentanone, and 1~ 50% by mass of (B) glycerol carbonate. |
priorityDate | 2012-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 44.