http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201400996-A

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classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-42
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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C07C69-96
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42
filingDate 2012-10-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0e62a2c1bbbc838b397b78a791c27dfa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b970e8816be93244bb981eec2a6ef5b8
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publicationDate 2014-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201400996-A
titleOfInvention Photoresist stripper
abstract The present invention provides a photoresist release agent which has excellent photoresist peeling performance as a photoresist release agent and which does not precipitate or reattach to the substrate when washed with pure water. Furthermore, the present invention provides a photoresist release agent that is non-corrosive and reusable for metal wiring, especially for copper wiring. The photoresist stripper of the present invention is characterized in that it is selected from 50 to 99% by mass of (A) one selected from ethyl carbonate, propyl carbonate, γ-butyrolactone and cyclopentanone, and 1~ 50% by mass of (B) glycerol carbonate.
priorityDate 2012-06-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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