Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_eccd894c99fea2d1c0c8735872bb2309 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-003 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01B13-0006 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K13-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L31-1888 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K13-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate |
2013-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4f7cc3fbc8923eb31e70223513c51114 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4dbf3d6773269f0bb1198762c975037b |
publicationDate |
2014-01-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201400592-A |
titleOfInvention |
Photoactivated etching paste and its use |
abstract |
The present invention provides an improved method of etching a transparent conductive oxide layer disposed on a flexible polymer substrate, a rigid substrate such as a glass or germanium wafer, the method comprising using a novel etch paste that is activated by irradiation. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I677106-B |
priorityDate |
2012-06-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |