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filingDate 2012-06-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dde5d77f72c0d4f9982e18e35e1d00fa
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publicationDate 2013-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201351704-A
titleOfInvention Method for preparing light emitting diode
abstract The invention relates to a method for preparing a light-emitting diode, comprising the steps of: providing a substrate having an epitaxial growth surface; and sequentially epitaxially growing a first semiconductor layer, an active layer and a first layer on the epitaxial growth surface of the substrate a second semiconductor layer; a first optically symmetric layer is disposed on a surface of the second semiconductor layer away from the substrate; a metal plasma generating layer is disposed on a surface of the first optical symmetric layer away from the substrate; and the metal plasma is generated Forming a second optically symmetric layer from the surface of the substrate; forming a first electrode electrically connected to the first semiconductor layer; and forming a second electrode electrically connected to the second semiconductor layer.
priorityDate 2012-06-07-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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