http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201348868-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02P70-50 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y02E10-50 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-008 |
| filingDate | 2013-02-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_789739ea95f715cfaaad933eb89bf7b4 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0af87f7f14f76735a6cd8f4c4a79a267 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c86a4898bd5b8c494590ac7d2634e41 |
| publicationDate | 2013-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201348868-A |
| titleOfInvention | Method for forming resist pattern, pattern forming method, solar cell and positive resist composition |
| abstract | The method for forming a resist pattern of a certain aspect of the present invention comprises: containing a novolac resin (A) and a phenol (B1) having a tris(hydroxyphenyl)methane skeleton and a quinonediazide group. a photosensitive agent (B) of an ester compound of a sulfonyl compound (B2), and a positive resist composition having a light transmittance of 365 nm at a wavelength of 0.45 nm of a resist film having a thickness of μm, which is coated with solar energy A step of forming a resist film on the support of the battery substrate, selectively exposing the resist film to light, and exposing the exposed resist film with an alkali solution to remove the exposed portion. |
| priorityDate | 2012-03-13-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 219.