| abstract |
The present invention provides an oxide sputtering target which is used as a protective film for an optical recording medium, and which can form a film which is highly preservative, has flexibility and is not easily broken, and can be subjected to DC sputtering at the time of sputtering. There are also fewer particles. The oxide sputtering target system contains a total of one or more of Al, Ga, and In with respect to the total amount of metal components: 0.15 at% or more, and Sn: 7 at% or more, and the total of Al, Ga, In, and Sn: 36 at% Hereinafter, the remainder is an oxide sintered body composed of Zn and unavoidable impurities. |