| abstract |
An object of the present invention is to provide a passivation film in which electrical insulating properties, heat resistance, solvent resistance, and dry etch back characteristics are simultaneously established. The solution comprises containing the following formula (i): □ (wherein T0 represents a sulfonyl group, a fluoroalkyl group, a cyclic alkyl group, a substituted aryl group having a substituent, or a stretching group having a substituent In the polymer of unit structure of a combination of an aryl group and a fluorine alkyl group or a cyclic alkyl group, at least one of the terminal, branch or main chain of the polymer has the formula (2-A), the formula (2- B) A composition for forming a passivation film of a polymer based on the structure of both of them. -C≡C- The formula (2-A)□ polymer may contain the unit structure of the following formula (1):□. |