| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2603-74
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C2601-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1818
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C07C69-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-283
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1806
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2013-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7583c5ef3c449c07a1653717ed916d1a
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd0220ce37934efb7eb2a8d8dd8df057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ca9ca98b9e27b142c456023e8d2bbfc8 |
| publicationDate |
2013-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201346442-A |
| titleOfInvention |
Photoresist composition, method for forming photoresist pattern, polymer and compound |
| abstract |
The present invention is a photoresist composition containing [A] a polymer having a structural unit represented by the following formula (1) and a [B] acid generator. In the following formula (1), R1 is a divalent polycyclic alicyclic hydrocarbon group having 4 to 20 carbon atoms. R2 is a monovalent monocyclic or polycyclic alicyclic hydrocarbon group having 3 to 20 carbon atoms. R3 is a hydrogen atom, a fluorine atom, a methyl group or a trifluoromethyl group. The [A] polymer preferably contains at least one structural unit selected from the group consisting of a lactone structure, a cyclic carbonate structure and a sultone structure. The [A] polymer preferably further contains a structural unit represented by the following formula (2). □ |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I754683-B |
| priorityDate |
2012-03-06-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |