| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_fcc0b66123940d1b32783569ebfa2d45 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 |
| filingDate |
2013-03-26-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_828e44f905150668e0a8e8ce1165781b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_464eb51a5a437677166a8551512254f3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cd0220ce37934efb7eb2a8d8dd8df057
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_dcb2c4837169cb5346fc2ab4884a4187
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e8630c62dea6ad9b2c3a8e129c90d798
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_86814d3ff6ce1a5ec3b82d862c28cd73 |
| publicationDate |
2013-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201344367-A |
| titleOfInvention |
Radiation-sensitive resin composition for liquid immersion exposure and method for forming photoresist pattern |
| abstract |
The present invention is a radiation-sensitive resin composition for liquid immersion exposure containing [A] a polymer having a structural unit represented by the following formula (1) and a [B] radiation-sensitive acid generator. In the following formula (1), R1 is a hydrogen atom or a monovalent organic group having 1 to 20 carbon atoms. R2 is a single bond, a divalent chain hydrocarbon group having 1 to 20 carbon atoms, a divalent alicyclic hydrocarbon group having 3 to 20 carbon atoms, or a combination of one or more of these and -O-. R3 is a hydrogen atom or a one-valent organic group having 1 to 20 carbon atoms. RA is a hydrogen atom or a one-valent organic group having 1 to 20 carbon atoms. □ |
| priorityDate |
2012-03-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |