http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201339358-A

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-54
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-455
filingDate 2012-10-26-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e5b730c161f1829d906c4991c1382546
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publicationDate 2013-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201339358-A
titleOfInvention Film forming device and film forming method
abstract The present invention provides a film forming apparatus and a film forming method, and a film forming apparatus 1 for forming a vapor phase epitaxial film on a substrate includes a reaction chamber 2, an exhaust mechanism 3, and a pipe 4 connecting the same. The inert gas supply pipe 11 is disposed in the middle of the pipe 4, and the inert gas 15 is supplied to the inside; and the collecting portion 5' is connected to the discharge pipe 16 that discharges the reaction product 14. At the time of film formation, a substrate is placed in the reaction chamber 2, and a reaction gas 7 is supplied from the reaction gas supply pipe 8 to form a film on the substrate. The collecting unit 5' collects the reaction product 14 in the exhaust gas 6. After the film formation, the inert gas 15 is supplied from the inert gas supply pipe 11 to the collecting portion 5', and the stored reaction product 14 is pressure-fed from the discharge pipe 16 to the detoxification device 20.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I794817-B
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priorityDate 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 31.