| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_a665d61597c2731ab4130971ee397dc9 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-20 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1436
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-1463
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09G1-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B24B37-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 |
| filingDate |
2012-11-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b2451672b1d0ad2577c477c21b6f24af
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_930b51b37360bee3adef2aa255995c68
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e2efb131c9735a231f9c5e20debdcdd6
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_504141c248f62d92ab25a0465303e736 |
| publicationDate |
2013-10-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201339256-A |
| titleOfInvention |
Grinding composition |
| abstract |
The polishing composition of the present invention used for polishing a polishing object having a portion containing a III-V compound material contains abrasive grains, an oxidizing agent, and a water-soluble polymer. The water-soluble polymer may be one or more of 5,000 or more molecules per 1 μm 2 of the surface area of the abrasive grains after the polishing composition is allowed to stand at a temperature of 25 ° C for one day. Alternatively, it may be a compound in which the water contact angle of the portion of the object to be polished containing the III-V compound material after polishing the object to be polished is polished using the polishing composition. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I794163-B |
| priorityDate |
2011-11-25-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |