http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201337463-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5af07dd0699c93464d2ea28a07802991 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0233 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-033 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-312 |
| filingDate | 2013-02-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_76584b2df7f4881d86ce4c101b9ecbe0 |
| publicationDate | 2013-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201337463-A |
| titleOfInvention | Chemically amplified positive-sensing type high-sensitivity organic insulating film composition excellent in heat resistance and method for forming organic insulating film using the same |
| abstract | The present invention relates to a chemically amplified positive photosensitive high-sensitivity organic insulating film composition excellent in heat resistance and a method of forming an organic insulating film using the same, the chemically amplified positive photosensitive high-sensitivity organic insulating film composition comprising A binder resin characterized by comprising a unit substance comprising an acid-decomposable protecting group having an active energy ray or a cross-linking group or having an active energy ray or heat A cross-linking group and a unit substance not containing an acid-decomposable protecting group, and at least one or more of the unit substances are contained simultaneously or separately. The present invention has an advantage that, unlike the prior art, a unit substance containing an active energy ray crosslinkable or a thermally crosslinkable functional group on a molecular structure of an acid-decomposable protective group or a non-acid-decomposable protective group is constituted as a polymer. The form of the copolymer, or a mixture thereof, thereby not only maintaining excellent sensitivity and resolution characteristics, but also significantly reducing volatilization vapor generated during exposure, and suppressing the coating film during the thermal process after patterning A phenomenon of deformation of the pattern due to heat shrinkage or thermal flow, whereby the pattern shape is maintained within a desired slope (taper angle). |
| priorityDate | 2012-02-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 71.