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filingDate 2012-02-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e866760b2f986becde5fffad4e9209df
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publicationDate 2013-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201336001-A
titleOfInvention Fine pitch bump manufacturing method and structure thereof
abstract A fine pitch bump manufacturing method comprising: providing a germanium substrate; forming a titanium-containing metal layer on the germanium substrate, wherein the titanium-containing metal layer has a plurality of first and second segments; forming a photoresist layer a titanium-containing metal layer; patterning the photoresist layer to form a plurality of trenches; forming a plurality of copper bumps on the plurality of trenches, each of the copper bumps having a first top surface and a ring wall; performing a heating step The photoresist layer is heated to form a plurality of body portions and a plurality of removable portions; an etching step is performed on the photoresist layer to remove the removable portions; and a plurality of bump protection layers are formed on the a first metal layer, a first top surface of the copper bump, and the ring wall; forming a plurality of wettable layers on the bump protection layer; removing the photoresist layer; and removing the titanium-containing metal layer The second sections are formed such that the first sections of the titanium-containing metal layer are formed as an under bump metal layer, and each of the under bump metal layers has a bump bearing portion and an extension portion.
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