| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_0606c8e113c860d8a6c41e2aaaf3120d |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-34
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-50
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D7-26
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-42 |
| filingDate |
2012-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9ac065c818068652a814fdab2f43753b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_18f47657288576cd97fe9241f67013cb |
| publicationDate |
2013-09-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201335724-A |
| titleOfInvention |
Photoresist stripping liquid composition and application thereof |
| abstract |
The present invention discloses a photoresist stripping liquid composition comprising an alcohol amine compound (A), a glycol and/or an alcohol ether compound (B), and an organic solvent of an anthraquinone and/or an anthracene (C). . By the above-mentioned photoresist stripping liquid composition, the photoresist on the formed metal line can be completely removed and the metal line can be prevented from being corroded. |
| priorityDate |
2012-02-23-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |