Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_268be9afa00cf55b5aa72b1612151ecb |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H10B12-033 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L28-92 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-32134 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02068 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3081 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30608 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-306 |
filingDate |
2012-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_12a8dc53697a9aa533b75f401ecb5452 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0ef58a1bb9ec60924e5ac12d9a312802 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d45cc88f94e59d5b90c46f391b89d79c |
publicationDate |
2013-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201334056-A |
titleOfInvention |
Method for manufacturing semiconductor substrate product and etching method therefor |
abstract |
The present invention provides a method of manufacturing a semiconductor substrate product. The method for producing a semiconductor substrate article of the present invention comprises the steps of: preparing an aqueous solution containing 7% by mass or more and 25% by mass or less of a quaternary alkyl ammonium hydroxide; preparing a crucible composed of a polycrystalline germanium film or an amorphous germanium film a semiconductor substrate of the film; and heating the aqueous solution to 80 ° C or higher and applying to the semiconductor substrate to etch at least a portion of the ruthenium film. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I695055-B |
priorityDate |
2011-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |