Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31122 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31116 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-31138 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08L83-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0271 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0752 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-094 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09D183-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-56 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-039 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
filingDate |
2012-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c35dc31e0f008513854fb397a72146b http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b4f04400920727cf56f01b5702ae1a91 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3f7b12d6486335e786045da041448a4 |
publicationDate |
2013-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201331718-A |
titleOfInvention |
Composition for forming underlayer film of germanium containing photoresist and pattern forming method |
abstract |
An object of the present invention is to provide a photoresist underlayer film which can be applied not only to a photoresist pattern formed of a hydrophilic organic compound obtained in negative development but also to a hydrophobic compound obtained by conventional positive development. The photoresist pattern formed. The present invention relates to a composition for forming a photoresist film containing ruthenium containing at least one selected from the group consisting of organoboron compounds represented by the following general formula (1) and condensates thereof; (A) a condensate and/or a hydrolysis condensate of one or more kinds of the above-mentioned oxime compound (B) represented by the following formula (2); R1m0B(OH)m1(OR)(3-m0-m1 (1) R10m10R11m11R12m12Si(OR13)(4-m10-m11-m12) (2). |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I634381-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I636319-B |
priorityDate |
2011-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |