| abstract |
A method for preparing a film by using a radio frequency plasma assisted pulsed laser deposition system, comprising the steps of: preparing a radio frequency plasma assisted pulsed laser deposition system, placing a substrate on a second plate, and placing a cavity body Pumping a vacuum to a working pressure, first starting an RF power supply device to output energy with an output power, and generating a plasma source between the first and second plates, and then starting a pulse laser device to A laser beam is generated to bombard a target, and a film is formed on the substrate, and after a coating time, the RF power supply unit and the pulsed laser device are turned off. The coating process method can effectively improve the coating speed and film quality. |