http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201331119-A

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filingDate 2012-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cc54899dfe48524cf5a7ef5dfcd43ae9
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publicationDate 2013-08-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201331119-A
titleOfInvention Technique for coating nanowires on stitches in electronic devices
abstract The present invention describes a method and apparatus for forming a nanowire layer on a wiring trace. A device includes a first dielectric layer and a plurality of traces on the first dielectric layer, the traces comprising Cu. The stitches include a layer of ZnO nanowires thereon. A second dielectric layer is disposed on the first dielectric layer and the traces, wherein the second dielectric layer is in direct contact with the ZnO nanowire. Other embodiments are also described and claimed in the present invention.
priorityDate 2011-12-23-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 28.