| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_47cc435e1d443f13180f7766df104d9d |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-1802
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/Y10S430-106
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F2203-04103 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-04164
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-032
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-0443
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-0446
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G06F3-044
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-322
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G18-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-031
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-027 |
| filingDate |
2012-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_924cf08d8b277a06afd8da9dc19edbf1
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c12cee763db29fa152edc93ce28ca8c3
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1131353ef7dea87090989453c19e59b |
| publicationDate |
2013-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201329631-A |
| titleOfInvention |
Method for forming resin cured film pattern, photosensitive resin composition, photosensitive element, method for manufacturing touch panel, and resin cured film |
| abstract |
The method for forming a resin cured film pattern according to the present invention includes the step of providing a photosensitive layer containing a photosensitive resin composition on a substrate, wherein the photosensitive resin composition contains a binder polymer and photopolymerizability. a compound, a photopolymerization initiator and a thiol compound; a second step of hardening a predetermined portion of the photosensitive layer by irradiation with active light; and a third step of removing a predetermined portion of the photosensitive layer to form the photosensitive layer A cured film pattern of a predetermined portion; and the photosensitive resin composition contains an oxime ester compound and/or a phosphine oxide compound as the photopolymerization initiator. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I576751-B |
| priorityDate |
2011-12-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |