| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1af8df51ce24ca931ae718fb747f6aa0 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B05D3-06
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y10-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B82Y40-00
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0002
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-022 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B29C59-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 |
| filingDate |
2012-10-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30174aa091ae61f0181380e43429b35b
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_198e601c60c434db2e9d3b90cc6d0385
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_42b7e85a2f73a1f81f62bdb8a378f6ed |
| publicationDate |
2013-07-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201328853-A |
| titleOfInvention |
Method of forming a film |
| abstract |
The present invention provides a method of producing a film comprising: applying a photocurable composition containing a polymerizable monomer, a photopolymerization initiator, and a photosensitive gas generating agent that generates a gas via light stimulation on a substrate to form an applied a film; contacting a mold with the applied film; irradiating the applied film with light passing through the mold to cure the applied film and generating a gas in the applied film; and irradiating the light with light After applying the film, the mold is released from the applied film to form a film (cured film) having a predetermined pattern shape on the substrate, wherein the applied film is irradiated with light during the application of the film The polymerization rate of the polymerizable monomer is higher than the reaction rate of the gas generating reaction of the photosensitive gas generating agent in the applied film. |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I644181-B
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10754244-B2 |
| priorityDate |
2011-10-24-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |