| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_63415f052d55f580530dfc12b7adad17 |
| classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F226-02
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F220-56 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0392
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-20
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004 |
| filingDate |
2012-10-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0d5026d21beab69460236e9a766b9ee2
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_e3e6fa7e2e7727b944d093c9fbfd4988
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_aedf6dfd8535e58731c6bad3ef1fdd98 |
| publicationDate |
2013-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201324037-A |
| titleOfInvention |
Composition for forming fine photoresist pattern and pattern forming method using same |
| abstract |
An object of the present invention is to provide a composition capable of forming a fine negative-type resist pattern having no surface roughness, cross-linking defects, or unresolved defects, and a pattern forming method using the same. The solution of the present invention is a composition for forming a negative resist pattern by using a chemically amplified photoresist composition, and is used for forming a fine pattern in which a pattern is made fine by widening a photoresist pattern. A composition comprising: a polymer comprising any one of □ in a repeating unit; and a solvent. The composition is applied onto a negative resist pattern obtained by development with an organic solvent developing solution and heated to form a fine pattern. |
| priorityDate |
2011-10-11-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |