http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201323203-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_bc905cbef116a1ec61d12125af9427f3 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J35-04 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01J20-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B32B18-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-86 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/B01D53-04 |
| filingDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_611629913a8508951a4950fdc556d2f1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6cd3f32cb9174e79ad381a8e0d2d0bdc http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_eb5655873cdeff40ce52f5739af2788a http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c3b87b0f15ebb3ce490c86781b11ccc8 |
| publicationDate | 2013-06-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201323203-A |
| titleOfInvention | Method for forming ruthenium-based porous hole film layer, and gas adsorption/catalysis treatment device |
| abstract | The present invention provides a method of forming a ruthenium-based porous hole film layer, and a gas adsorption/catalysis treatment device. The method for forming a ruthenium-based porous hole film layer comprises: providing a ruthenium-based void material mixed with an adhesive material to obtain a composition, wherein the adhesive material comprises a siloxane compound or a bismuth hydride; The substrate is impregnated into the composition; and the ceramic substrate is subjected to a calcination process to obtain a ceramic substrate having a ruthenium-based porous hole film layer. |
| priorityDate | 2011-12-14-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 61.