| abstract |
The present invention discloses an apparatus for manufacturing a semiconductor. The device for manufacturing a semiconductor includes a cleaning chamber in which a cleaning process is performed on the substrate; an epitaxial chamber in which an epitaxial process for forming an epitaxial layer on each of the substrates is performed; a buffer chamber, Having a storage space for storing the substrates; and a transfer chamber having a side surface connected to the clean room, the buffer chamber, and the epitaxial chamber, the transfer chamber including a substrate handler for cleaning The substrates are transferred between the chamber, the buffer chamber, and the epitaxial chamber. The substrate handler continuously transports the substrates on which the cleaning process has been completed into the buffer chamber, transfers the substrates stacked in the buffer chamber to the epitaxial chamber, and continuously transports the individual formed thereon The substrates of the epitaxial layer enter the buffer chamber. |