http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201316125-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_424db9d56b06a23aed410fcf5df652f3 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-038 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L33-16 |
| filingDate | 2012-09-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ea0add81bb44226ce3a7adcf9dd82631 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_ff75dd10567284d4a55c06bee102a951 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2d08bfbb914272a63018aee5ccc2bbb8 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_15556c2022fb63b8ae7d2efcb64b8abe http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_68675c92dac1fc72c756bcab27ad2178 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3aa197a0faee499992f0da36115aa856 |
| publicationDate | 2013-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201316125-A |
| titleOfInvention | Pattern forming method and photoresist composition |
| abstract | A negative pattern forming method according to the present invention is characterized in that a photoresist composition is applied onto a substrate, and a photoresist film formed by heat treatment after coating is exposed to high-energy rays, and is heated after exposure. After the treatment, the unexposed portion of the photoresist film is selectively dissolved by a developer containing an organic solvent; the photoresist composition simultaneously contains: a polymer compound containing a repeating unit having a structure for protecting a hydroxyl group with an acid labile group, and light An acid generator, an organic solvent, a repeating unit having one or more fluorine atoms, and a polymer additive not containing a hydroxyl group; and the content of the polymer additive is 1 to 30% by mass based on the total polymer compound. The photoresist composition of the present invention exhibits a high receding contact angle of the wettable exposure while exhibiting a broad resolution depth of a high resolution, fine groove pattern or hole pattern by combining with negative development of an organic solvent, and the line pattern can be improved The verticality of the sidewalls enhances the pattern collapse resistance. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I713478-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-105122144-A |
| priorityDate | 2011-09-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
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