http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201315830-A

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assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_91943488b68ac64c91e5a094819621d6
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C14-35
filingDate 2011-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22ba47d32143d7980c1d476569f12ec0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5849f3afdc31f23c1453735c4fe90bfe
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bb4372688455c94566e4e9b5ed1f5f4b
publicationDate 2013-04-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201315830-A
titleOfInvention High-power pulse magnetron coating method applied to low-temperature plastic coating
abstract The invention discloses a high-power pulse magnetron coating method applied to low-temperature plastic coating, which can deposit various films on a plastic material substrate, including a metal film and a reactive film, and is applied to functional components, 3C or decoration, etc. Various industries, the application range of expandable film in low temperature materials; the pulse current and average power of high power pulsed magnetron sputtering control the temperature of the object to be plated, because the plasma density of this process is hundreds of traditional plasma Double, can easily activate the plastic surface, the process can be directly coated without the need of traditional activation steps, and the plastic surface can establish self-dipole bias of several volts to several tens of volts in high-density plasma. The adhesion of the film is higher than that of traditional magnetic control plasma. It can be applied to all kinds of low-temperature substrate deposition films to enhance the application range of traditional plastic coating.
priorityDate 2011-10-14-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 27.