http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201314373-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_1543b2b19ec0e331a0dcd89888cbef5f |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-405 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-40 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0273 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D11-00 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C11D1-00 |
| filingDate | 2012-08-09-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2e33e19cecd324d67d3d2607118c4740 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_22a4f50ba3f78fd087e28c7c5466cb4e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_2419627192b27c3af578b0e09f7a125b |
| publicationDate | 2013-04-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201314373-A |
| titleOfInvention | Perfluoroalkylsulfonamide surfactant for photoresist rinse solution |
| abstract | The present invention provides a method of modifying the surface of a photoresist material, the method comprising exposing a photoresist material to an aqueous ionic surfactant solution, and changing a pH of the aqueous ionic surfactant solution until the photoresist material Forming a fluoride layer on or in the photoresist material. The aqueous ionic surfactant solution comprises a perfluoroalkylsulfonamide of the formula RfSO2NH-R' wherein Rf = CnF2n+1 - and n = 1 to 6, R' = -H, -CH3 and -CH2CH2OH. The aqueous ionic surfactant solution has a pH in about 3 pH units of the pKa of the perfluoroalkylsulfonamide. |
| priorityDate | 2011-08-10-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 31.