| abstract |
A resist composition comprising: a resin having a structural unit represented by the formula (I), which is insoluble or poorly soluble in an aqueous alkaline solution but which becomes soluble in an alkaline aqueous solution by the action of an acid and does not contain the formula (I) The resin of the structural unit, the acid generator, and the compound represented by the formula (II), wherein R1, A1, A13, A14, X12, R23 and ring W21 are as defined in the specification. |