| abstract |
A resist composition having a resin having a structural unit represented by the formula (I), which is insoluble or poorly soluble in an aqueous alkaline solution but which becomes soluble in an alkaline aqueous solution by the action of an acid and does not contain the formula (I) The resin of the structural unit shown, and the acid generator, wherein R1, A1, A13, A14, X12, Q1, Q2, L1, ring W, Rf1 and Rf2, n and Z+ are as defined in the specification. |