http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201312260-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-20 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F1-62 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-62 |
filingDate | 2012-07-30-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_311ddcbdfb459b3b688c1802943f25c9 |
publicationDate | 2013-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201312260-A |
titleOfInvention | Film for lithography, mask for attached film, and exposure treatment method |
abstract | The present invention provides a lithography film having a surface film excellent in light resistance to light having a wavelength of 250 nm or less, particularly 200 nm or less, a reticle using a surface film using the film, and an exposure processing method. The film for lithography according to the present invention has a multilayer film, and the multilayer film contains a film composed of a fluoropolymer (A) and a film composed of a fluoropolymer (B). And the fluoropolymer (A) contains, as a main component, a repeating unit obtained by cyclization polymerization of a perfluorodiene having one etheric oxygen atom, and the fluoropolymer (B) has a fluorinated aliphatic ring a fluorine-containing aliphatic cyclic structure containing two or three etheric oxygen atoms not adjacent to each other in the cyclic structure; and the total of the films composed of the fluoropolymer (B) The film thickness is 40% or less of the total film thickness of the film composed of the fluoropolymer (A). |
priorityDate | 2011-07-29-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 78.