http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201312257-A

Outgoing Links

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classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F1-24
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filingDate 2012-08-31-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6c27c179610fef7e678f256be168af2
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publicationDate 2013-03-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201312257-A
titleOfInvention Reflective mask substrate, method for manufacturing reflective mask substrate, and quality management method for reflective mask substrate
abstract The present invention relates to a reflective mask substrate having a substrate, a reflective multilayer film that reflects exposure light, and an absorber layer that absorbs the exposure light, and further includes a fiducial mark on the surface of the reflective multilayer film. Or a surface formed on one of the layers between the reflective multilayer film and the absorbing layer is formed in a concave shape or a convex shape, and represents a reference position of the reflective multilayer film, the reference mark is a reflectance of light for a specific wavelength and the reference The periphery of the mark is formed differently and transferred to a layer formed on the above-mentioned reference mark.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I808103-B
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Total number of triples: 27.