| Predicate |
Object |
| assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_89afae566b725ae78e20cf972d9bcdc7 |
| classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0045
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0046
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-028
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0397
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2041
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-32
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-325 |
| classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-004
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-26 |
| filingDate |
2012-04-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_da70f0ee751771143f8486e137fe5bfa
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_52cce40b8476edb4278cec332665b093 |
| publicationDate |
2013-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber |
TW-201307993-A |
| titleOfInvention |
Negative development photoresist composition, and photoresist pattern formation method |
| abstract |
A negative-type developing photoresist composition comprising: a substrate component (A) containing a solubility in an organic solvent reduced by an action of an acid, and an acid generator component (B) which generates an acid via exposure a step of forming a photoresist film on the support, a step of exposing the photoresist film, and patterning the photoresist film by negative development using the developer containing the organic solvent to form a photoresist A photoresist composition for use in a method for forming a resist pattern of a pattern, characterized in that the acid generator component (B) contains an acid which can produce a log P value of 2.7 or less and a pKa of -3.5 or more. Acid generator (B1). |
| isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I691786-B |
| priorityDate |
2011-04-05-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type |
http://data.epo.org/linked-data/def/patent/Publication |