Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_ee1c19da359446fb5c4f0458a57b783d |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-02024 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09G1-02 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-0475 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-30625 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C09K3-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/B24B37-00 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-304 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C09K3-14 |
filingDate |
2012-05-31-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0a52c78287772e6465bdc60e7a992b33 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_5a669e03acc73cdb36cf622559cb6a1e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_201e2b369eae41bfa2828b2ae71d4483 |
publicationDate |
2013-02-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201307541-A |
titleOfInvention |
Abrasive and grinding method |
abstract |
The present invention provides an abrasive for polishing a non-oxide single crystal substrate such as a tantalum carbide single crystal substrate at a high polishing rate to obtain a smooth surface. The abrasive is characterized by containing a transition metal-containing oxidizing agent having an oxidation-reduction potential of 0.5 V or more, cerium oxide particles and cerium oxide particles, and a dispersion medium, and the mass ratio of the content of the cerium oxide particles to the content of the cerium oxide particles The value is 0.2~20. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I745563-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I749127-B |
priorityDate |
2011-06-03-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |