http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201305736-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_5e5e4671b3ba1fd59502c47747a80896
classificationCPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0388
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08F30-08
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0042
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0043
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0758
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-2002
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-027
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-075
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08K3-08
filingDate 2012-06-18-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_3c69f360583b76f606fe888df4f4fe1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4c9001dbd425910684ee27a0594487de
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_10369f60242d2576bba765f969478df2
publicationDate 2013-02-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201305736-A
titleOfInvention Lithography patterning program and photoresist used therein
abstract The present invention relates to a lithography process comprising using a ruthenium-containing polymer present in a photoresist material or a compound comprising at least one element selected from the group consisting of: EUV lithography procedures: Ta, W , Re, Os, Ir, Ni, Cu or Zn. The wavelength of the EUV light used in the program is less than 11 nm, for example, 6.5 nm to 6.9 nm. The invention further relates to novel ruthenium containing polymers.
priorityDate 2011-07-08-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577471
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID449266279
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419558793
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID19985548
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID421348734
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23974
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID160029099
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID150841781
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID415715699
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID138202
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID417217717
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID458393742
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID420527290
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23950
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID28459
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID15913
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID451501102

Total number of triples: 38.