Predicate |
Object |
assignee |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_73aeddf6b80f70ea84bb645d4f4edf75 |
classificationCPCAdditional |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76843 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-76855 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4933 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-456 |
classificationCPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-324 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-66666 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-3215 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-7827 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28562 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28518 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28556 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-4933 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-45 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L21-28052 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-406 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/H01L29-665 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C23C16-45527 |
classificationIPCInventive |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-30 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C23C16-56 |
filingDate |
2012-04-20-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor |
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_7b88d77ae09f1baa2cfefdb1a7953277 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_866ed5cda35f973ac7fc6a3769ee337e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_d1df325a94e2cce01d62d112522a631d http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0635ac2310a27bc5944ccba28e7264a1 |
publicationDate |
2013-01-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber |
TW-201303062-A |
titleOfInvention |
Metal telluride, metal telluride, method for producing the same, and nickel film deposition |
abstract |
The present invention provides a method of deuteration and deuteration. In some embodiments, a method of forming a metal telluride can include forming a non-oxide interface such as germanium or solid germanium over an exposed germanium region of the substrate. A metal oxide is formed over the interface layer. Annealing and reduction causes the metal from the metal oxide to react with the underlying layer and form a metal halide. Alternatively, the metal telluride can be formed by reduction of the metal oxide on the ruthenium, regardless of whether any underlying ruthenium is also deuterated. In other embodiments, nickel is deposited directly without the use of an interfacial layer. The present invention also provides a method of depositing a nickel thin film by a vapor deposition process. In some embodiments. A nickel film is deposited by ALD. |
isCitedBy |
http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I684667-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/US-10619241-B2 http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I736541-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I582260-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I555870-B |
priorityDate |
2011-04-22-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type |
http://data.epo.org/linked-data/def/patent/Publication |