| abstract |
An object of the present invention is to provide a highly practical and sexy radiation-linear resin composition which is not only simple and efficient, but also can be applied to a semiconductor manufacturing process. The solution of the present invention is a radiation sensitive resin composition containing (A) a resin having a repeating unit represented by the general formula (1), (B) an acid generator, and (E) a general formula (8). Represents a photo-disinfecting base. However, in the general formula (1), R1 represents a hydrogen atom or a methyl group, and R2 represents a hydrocarbon group; in the general formula (8), R18 to R20 independently of each other represent an alkyl group, an alkoxy group, a hydroxyl group, or a halogen atom, and Z- represents Anions such as OH-, R-COO-, and R-SO3- (but, R represents an alkyl group, an aryl group, or an alkylaryl group). □ |