http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201249740-A

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filingDate 2012-04-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_328f57e0e6e88285dfb87aec14a5ee1d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_8e6a0d13e4083773edbc121a8e29b041
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publicationDate 2012-12-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201249740-A
titleOfInvention Inorganic polysilazane, silica film-forming coating liquid containing same, and method for forming silica film
abstract The present invention provides: an inorganic polysilazane which does not contract much in a firing process in an oxidant such as water vapor and provides a silica film that is not easily cracked nor separated from a semiconductor substrate; and a silica film-forming coating liquid which contains the inorganic polysilazane. The present invention specifically provides: an inorganic polysilazane which has a value of A/(B + C) of 0.9-1.5 and a value of (A + B)/C of 4.2-50 when the peak area within the range from 4.75 ppm (inclusive) to 5.4 ppm (exclusive) is represented by A, the peak area within the range from 4.5 ppm (inclusive) to 4.75 ppm (exclusive) is represented by B, and the peak area within the range from 4.2 ppm (inclusive) to 4.5 ppm (exclusive) is represented by C in an 1H-NMR spectrum, while having a mass average molecular weight of 2,000-20,000 in terms of polystyrene; and a silica film-forming coating liquid which contains the inorganic polysilazane.
isCitedBy http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I601764-B
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priorityDate 2011-06-13-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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