http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201248331-A
Outgoing Links
Predicate | Object |
---|---|
assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_2baf849d216e689ecc40ccc931a7a7bc |
classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-11 |
classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-11 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08F220-58 |
filingDate | 2012-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cae1ada8c4a1cb995f85e11f867aecb7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_31c3da48141cf33839cfbc6b5598dbc1 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_0666762a4e064aeb8f5dd1b8869f7622 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_90a1d41ea9579762e33aa1fb98bdd9d7 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_bc6a19055ab71bfe7066169b927fae8b |
publicationDate | 2012-12-01-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
publicationNumber | TW-201248331-A |
titleOfInvention | Non-photosensitive resist underlayer film forming composition |
abstract | To provide a novel composition for forming a non- photosensitive resist underlayer film. A composition for forming a non-photosensitive resist underlayer film, which comprises a polymer having a structural unit represented by formula (1) (wherein R1 represents a hydrogen atom, or a methyl group; R2 represents an alkylene group having 1 to 3 carbon atoms, or a phenylene group which may have a substituent; and R3 represents a hydroxy group, or a carboxyl group), a compound having at least two substituents independently selected from the group consisting of a block isocyanate group, a methylol group and an alkoxymethyl group having 1 to 5 carbon atoms, and a solvent. |
priorityDate | 2011-02-04-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 134.