http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201246332-A

Outgoing Links

Predicate Object
assignee http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_950bce8d103dab1bd282965fde47f9f3
classificationIPCInventive http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-31
http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H01L21-302
filingDate 2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_44151d28c961fb8e73df559ec4fd7df0
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_a6895aece2b37a86f1ff992fed360a4d
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_30cf23fd95626dd93e917a5432f2f753
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_c5b57f5ea9b21c8867fe611298f76d3c
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_b163d5a313e1389189785ee6b798b6c9
http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_9c4c9293ceda17b922aee43bf0b42fd7
publicationDate 2012-11-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201246332-A
titleOfInvention Substantially non-oxidizing plasma treatment devices and processes
abstract Non-oxidizing plasma treatment devices for treating a semiconductor workpiece generally include a substantially non-oxidizing gas source; a plasma generating component in fluid communication with the non-oxidizing gas source; a process chamber in fluid communication with the plasma generating component, and an exhaust conduit centrally located in a bottom wall of the process chamber. In one embodiment, the process chamber is formed of an aluminum alloy containing less than 0.15% copper by weight; In other embodiments, the process chamber includes a coating of a non-copper containing material to prevent formation of copper hydride during processing with substantially non-oxidizing plasma. In still other embodiments, the process chamber walls are configured to be heated during plasma processing. Also disclosed are non-oxidizing plasma processes.
priorityDate 2011-04-28-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

Incoming Links

Predicate Subject
isDiscussedBy http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559466
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID431905128
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419524915
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID448528323
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID425193155
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID6857661
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID74765618
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5359268
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23978
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578935
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5460631
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID24261
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID9321
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419491804
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID418354341
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419578752
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419556970
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559527
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419559593
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID977
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID14150947
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419523291
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID783
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID457707758
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419577374
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID5352426
http://rdf.ncbi.nlm.nih.gov/pubchem/substance/SID419579069
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID27284
http://rdf.ncbi.nlm.nih.gov/pubchem/compound/CID23987

Total number of triples: 46.