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filingDate 2011-11-29-04:00^^<http://www.w3.org/2001/XMLSchema#date>
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publicationDate 2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201243960-A
titleOfInvention Display device and method for manufacturing the same
abstract A conductive layer to be a gate electrode, an insulating layer to be a gate insulating layer, a semiconductor layer, and an insulating layer to be a channel protective layer, which are each included in a transistor, are successively formed without exposure to the air. A gate electrode (including another electrode or a wiring which is formed in the same layer) and an island-like semiconductor layer are formed through one photolithography step. A display device is manufactured through four photolithography steps including the photolithography step, a photolithography step of forming a contact hole, a photolithography step of forming a source electrode and a drain electrode (including another electrode or a wiring which is formed in the same layer), and a photolithography step of forming a pixel electrode (including another electrode or a wiring which are formed in the same layer).
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