http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201242744-A

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filingDate 2011-09-02-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_46f0b7241de4ae8d4623de9e671d67fb
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publicationDate 2012-11-01-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201242744-A
titleOfInvention Method of manufacturing cylindrical mold and apparatus for the same
abstract Provided is a method for manufacturing a cylindrical mold that can be used to advantage in nanoimprinting, wherein the mold is manufactured with high productivity and high precision. The method is used to manufacture a cylindrical mold having a fine irregular pattern on the external peripheral surface, wherein the method for manufacturing a cylindrical mold is characterized in comprising: rotating a cylindrical transfer plate (50) having an external cylindrical part (20) that includes a light-transmitting cylindrical member (12) and a photocuring transfer layer (13), the photocuring transfer layer (13) being formed on the external peripheral surface of the cylindrical member (12) and being deformable by pressure; simultaneously bringing, under pressure, the transfer layer (13) of the external cylindrical part (20) into contact with a fine irregular pattern (72) on an original mold (70) that has the fine irregular pattern on the surface that moves in the same direction as does the cylindrical transfer plate (50); transferring the fine irregular pattern (72) onto the transfer layer (13); and irradiating and curing the transfer region (15) of the transfer layer (13) with ultraviolet light from the internal peripheral side of the external cylindrical part (20), and continuously forming an inverted irregular pattern on the transfer layer (13) simultaneously with the transfer.
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