http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201237204-A

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filingDate 2011-10-17-04:00^^<http://www.w3.org/2001/XMLSchema#date>
inventor http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_cee61e7dcf8b15c25696891a907b7346
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publicationDate 2012-09-16-04:00^^<http://www.w3.org/2001/XMLSchema#date>
publicationNumber TW-201237204-A
titleOfInvention RF impedance matching network with secondary DC input
abstract Embodiments of the disclosure may provide a matching network for a physical vapor deposition system. The matching network may include an RF generator coupled to a first input of an impedance matching network, and a DC generator coupled a second input of the impedance matching network. The impedance matching network may be configured to receive an RF signal from the RF generator and a DC signal from the DC generator and cooperatively communicate both signals to a deposition chamber target through an output of the impedance matching network. The matching network may also include a filter disposed between the second input and the output of the impedance matching network.
priorityDate 2010-10-20-04:00^^<http://www.w3.org/2001/XMLSchema#date>
type http://data.epo.org/linked-data/def/patent/Publication

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Total number of triples: 22.