http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-201234107-A
Outgoing Links
| Predicate | Object |
|---|---|
| assignee | http://rdf.ncbi.nlm.nih.gov/pubchem/patentassignee/MD5_4d72711e97d894c55af805c9de2053ab |
| classificationCPCAdditional | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08K5-5435 |
| classificationCPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0007 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-0757 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-14 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-027 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/C08G77-16 http://rdf.ncbi.nlm.nih.gov/pubchem/patentcpc/G03F7-038 |
| classificationIPCInventive | http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/H05K3-28 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/C08L83-06 http://rdf.ncbi.nlm.nih.gov/pubchem/patentipc/G03F7-028 |
| filingDate | 2011-12-27-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| inventor | http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ba36cb0c95687c964c8d9677b9cca8e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_6ee7b0a91ce4a799ede448b3f05ea33e http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_acf56a20a36562f8c225ef2c946ffef6 http://rdf.ncbi.nlm.nih.gov/pubchem/patentinventor/MD5_4fd2de88d15aae26bd12ef75f4aab3be |
| publicationDate | 2012-08-16-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| publicationNumber | TW-201234107-A |
| titleOfInvention | Photosensitive resin composition, overcoat layer and electronic device using the same |
| abstract | Provided is a photosensitive resin composition, including: an organosiloxane polymer having one or more selected from the group consisting of an epoxy group, a glycidyl group and a hydroxyl group; an acrylate compound having an ethylenic unsaturated double bond; a photopolymerization initiator; and an organic solvent. The photosensitive resin composition is advantageous in that it can form a uniform and stable coating film when it is applied on a color substrate by spin coating and simultaneously can prevent spots, stains, blots and the like from occurring on the coating film, it can easily create patterns using a developer by curing a transmission film using a small amount of light, it does not generate cracks at a high temperature of 200 to 400 DEG C, it has excellent load resistance even when it is heated at high temperature, it has excellent thermal stability because it generates a small amount of sublimate when it is fired, and in that the protective film obtained by curing the photosensitive resin composition has a transmissivity of 95% or more in a wavelength range of 400 to 800 nm, and the adhesivity between the protective film and a substrate is 5B or more. |
| isCitedBy | http://rdf.ncbi.nlm.nih.gov/pubchem/patent/TW-I708999-B http://rdf.ncbi.nlm.nih.gov/pubchem/patent/CN-110955112-A |
| priorityDate | 2010-12-28-04:00^^<http://www.w3.org/2001/XMLSchema#date> |
| type | http://data.epo.org/linked-data/def/patent/Publication |
Incoming Links
Total number of triples: 118.